Details

Title

Semiconductor contact layer characterization in a context of hall effect measurements

Journal title

Metrology and Measurement Systems

Yearbook

2019

Volume

vol. 26

Numer

No 1

Authors

Keywords

metal contact ; contact layer ; contact resistance ; Hall effect ; resistivity ; van der Pauw method ; MSM structure ; semiconductors’ characterization

Divisions of PAS

Nauki Techniczne

Coverage

109-114

Publisher

Polish Academy of Sciences Committee on Metrology and Scientific Instrumentation

Date

2019.04.01

Type

Artykuły / Articles

Identifier

ISSN 0860-8229

DOI

10.24425/mms.2019.126324

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